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Direct photoetching of evaporated germanium and its use in mask fabrication.

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Bibliographic Details
Title: Direct photoetching of evaporated germanium and its use in mask fabrication.
Authors: Sullivan, M. V., Kolb, G. A.
Source: Electrochemical Technology.; November 1968, Vol. 6, p430-434, 5p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 516656099
AccessLevel: 2
PubType: Periodical
PubTypeId: serialPeriodical
PreciseRelevancyScore: 0
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  Data: Direct photoetching of evaporated germanium and its use in mask fabrication.
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  Data: <searchLink fieldCode="AU" term="%22Sullivan%2C+M%2E+V%2E%22">Sullivan, M. V.</searchLink><br /><searchLink fieldCode="AU" term="%22Kolb%2C+G%2E+A%2E%22">Kolb, G. A.</searchLink>
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  Data: <searchLink fieldCode="JN" term="%22Electrochemical+Technology%2E%22">Electrochemical Technology.</searchLink>; November 1968, Vol. 6, p430-434, 5p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=516656099
RecordInfo BibRecord:
  BibEntity:
    Languages:
      – Code: eng
        Text: English
    PhysicalDescription:
      Pagination:
        PageCount: 5
        StartPage: 430
    Titles:
      – TitleFull: Direct photoetching of evaporated germanium and its use in mask fabrication.
        Type: main
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      – PersonEntity:
          Name:
            NameFull: Sullivan, M. V.
      – PersonEntity:
          Name:
            NameFull: Kolb, G. A.
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          Dates:
            – D: 01
              M: 11
              Text: November 1968
              Type: published
              Y: 1968
          Identifiers:
            – Type: issn-print
              Value: 04248090
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            – Type: volume
              Value: 6
          Titles:
            – TitleFull: Electrochemical Technology.
              Type: main
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