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Direct photoetching of evaporated germanium and its use in mask fabrication.

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Bibliographic Details
Title: Direct photoetching of evaporated germanium and its use in mask fabrication.
Authors: Sullivan, M. V., Kolb, G. A.
Source: Electrochemical Technology.; November 1968, Vol. 6, p430-434, 5p
Database: Applied Science & Technology Source
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