Bibliographic Details
| Title: |
Comparison of the sputter rates of oxide films relative to the sputter rate of SiO2. |
| Authors: |
Baer, D. R.1, don.baer@pnl.gov, Engelhard, M. H.1, Lea, A. S.1, Nachimuthu, P.1, Droubay, T. C.2, Kim, J.3, Lee, B.3, Mathews, C.3, Opila, R. L.4, Saraf, L. V.1, Stickle, W. F.5, Wallace, R. M.3, Wright, B. S.4 |
| Source: |
Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; Sep2010, Vol. 28 Issue 5, p1060-1072, 13p, 5 Charts, 8 Graphs |
| Database: |
Applied Science & Technology Source |
