APA (7th ed.) Citation

Baer, D. R., Engelhard, M. H., Lea, A. S., Nachimuthu, P., Droubay, T. C., Kim, J., . . . Wright, B. S. (2010). Comparison of the sputter rates of oxide films relative to the sputter rate of SiO2. Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films, 28(5), 1060. https://doi.org/10.1116/1.3456123

Chicago Style (17th ed.) Citation

Baer, D. R., et al. "Comparison of the Sputter Rates of Oxide Films Relative to the Sputter Rate of SiO2." Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films 28, no. 5 (2010): 1060. https://doi.org/10.1116/1.3456123.

MLA (9th ed.) Citation

Baer, D. R., et al. "Comparison of the Sputter Rates of Oxide Films Relative to the Sputter Rate of SiO2." Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films, vol. 28, no. 5, 2010, p. 1060, https://doi.org/10.1116/1.3456123.