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Comparison of the sputter rates of oxide films relative to the sputter rate of SiO2.

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Title: Comparison of the sputter rates of oxide films relative to the sputter rate of SiO2.
Authors: Baer, D. R.1, don.baer@pnl.gov, Engelhard, M. H.1, Lea, A. S.1, Nachimuthu, P.1, Droubay, T. C.2, Kim, J.3, Lee, B.3, Mathews, C.3, Opila, R. L.4, Saraf, L. V.1, Stickle, W. F.5, Wallace, R. M.3, Wright, B. S.4
Source: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; Sep2010, Vol. 28 Issue 5, p1060-1072, 13p, 5 Charts, 8 Graphs
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 53422264
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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        Value: 10.1116/1.3456123
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        Text: English
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              Text: Sep2010
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