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Ultraviolet laser excited adsorbate-surface interactions: NH3, C2H4, and CH2I2 on Al and oxidized Al surfaces.

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Bibliographic Details
Title: Ultraviolet laser excited adsorbate-surface interactions: NH3, C2H4, and CH2I2 on Al and oxidized Al surfaces.
Authors: Chuang, T. J.1, Domen, K.1
Source: Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1989, Vol. 7 Issue 5, p1200-1207, 8p
Database: Applied Science & Technology Source
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  Availability: 0
Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 74326027
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Ultraviolet laser excited adsorbate-surface interactions: NH3, C2H4, and CH2I2 on Al and oxidized Al surfaces.
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  Data: <searchLink fieldCode="AU" term="%22Chuang%2C+T%2E+J%2E%22">Chuang, T. J.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Domen%2C+K%2E%22">Domen, K.</searchLink><relatesTo>1</relatesTo>
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Vacuum+Science+%26+Technology%3A+Part+B-Microelectronics+Processing+%26+Phenomena%22">Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena</searchLink>; 1989, Vol. 7 Issue 5, p1200-1207, 8p
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RecordInfo BibRecord:
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    Identifiers:
      – Type: doi
        Value: 10.1116/1.584572
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      – Code: eng
        Text: English
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      Pagination:
        PageCount: 8
        StartPage: 1200
    Titles:
      – TitleFull: Ultraviolet laser excited adsorbate-surface interactions: NH3, C2H4, and CH2I2 on Al and oxidized Al surfaces.
        Type: main
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          Name:
            NameFull: Chuang, T. J.
      – PersonEntity:
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            NameFull: Domen, K.
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          Dates:
            – D: 01
              M: 09
              Text: 1989
              Type: published
              Y: 1989
          Identifiers:
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              Value: 0734211X
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              Value: 7
            – Type: issue
              Value: 5
          Titles:
            – TitleFull: Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena
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