APA (7th ed.) Citation

Scheller, L., Weizman, M., Simon, P., Fehr, M., & Nickel, N. H. (2012). Hydrogen passivation of polycrystalline silicon thin films. Journal of Applied Physics, 112(6), 063711. https://doi.org/10.1063/1.4752268

Chicago Style (17th ed.) Citation

Scheller, L.-P, M. Weizman, P. Simon, M. Fehr, and N. H. Nickel. "Hydrogen Passivation of Polycrystalline Silicon Thin Films." Journal of Applied Physics 112, no. 6 (2012): 063711. https://doi.org/10.1063/1.4752268.

MLA (9th ed.) Citation

Scheller, L.-P, et al. "Hydrogen Passivation of Polycrystalline Silicon Thin Films." Journal of Applied Physics, vol. 112, no. 6, 2012, p. 063711, https://doi.org/10.1063/1.4752268.