Reactive-gas-flow sputter deposition of amorphous WO3 films for electrochromic devices
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| Title: | Reactive-gas-flow sputter deposition of amorphous WO3 films for electrochromic devices |
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| Authors: | Oka, N.1, Watanabe, M.1, Sugie, K.2, Iwabuchi, Y.2, Kotsubo, H.2, Shigesato, Y.1, yuzo@chem.aoyama.ac.jp |
| Source: | Thin Solid Films; Apr2013, Vol. 532, p1-6, 6p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00406090 |
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| DOI: | 10.1016/j.tsf.2012.11.149 |
