Reactive-gas-flow sputter deposition of amorphous WO3 films for electrochromic devices

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Title: Reactive-gas-flow sputter deposition of amorphous WO3 films for electrochromic devices
Authors: Oka, N.1, Watanabe, M.1, Sugie, K.2, Iwabuchi, Y.2, Kotsubo, H.2, Shigesato, Y.1, yuzo@chem.aoyama.ac.jp
Source: Thin Solid Films; Apr2013, Vol. 532, p1-6, 6p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 86393596
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Reactive-gas-flow sputter deposition of amorphous WO3 films for electrochromic devices
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PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=86393596
RecordInfo BibRecord:
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    Identifiers:
      – Type: doi
        Value: 10.1016/j.tsf.2012.11.149
    Languages:
      – Code: eng
        Text: English
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        PageCount: 6
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      – TitleFull: Reactive-gas-flow sputter deposition of amorphous WO3 films for electrochromic devices
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            NameFull: Oka, N.
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            NameFull: Watanabe, M.
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            NameFull: Sugie, K.
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            NameFull: Iwabuchi, Y.
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            NameFull: Kotsubo, H.
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            NameFull: Shigesato, Y.
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              Text: Apr2013
              Type: published
              Y: 2013
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              Value: 532
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