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Reactive-gas-flow sputter deposition of amorphous WO3 films for electrochromic devices

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Bibliographic Details
Title: Reactive-gas-flow sputter deposition of amorphous WO3 films for electrochromic devices
Authors: Oka, N.1, Watanabe, M.1, Sugie, K.2, Iwabuchi, Y.2, Kotsubo, H.2, Shigesato, Y.1, yuzo@chem.aoyama.ac.jp
Source: Thin Solid Films; Apr2013, Vol. 532, p1-6, 6p
Database: Applied Science & Technology Source
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