Feature Analysis and Modeling of 670 nm Laser Optical Endpoint Traces in Tungsten CMP.
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| Title: | Feature Analysis and Modeling of 670 nm Laser Optical Endpoint Traces in Tungsten CMP. |
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| Authors: | Mazzone, Giovanni1, Bano, Giuseppe2, Gianni, Davide Michele3, Castelletti, Luca1, Borsari, Silvia1 |
| Source: | IEEE Transactions on Semiconductor Manufacturing; Nov2013, Vol. 26 Issue 4, p542-548, 7p |
| Database: | Applied Science & Technology Source |
| ISSN: | 08946507 |
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| DOI: | 10.1109/TSM.2013.2271907 |
