APA (7th ed.) Citation

Mazzone, G., Bano, G., Gianni, D. M., Castelletti, L., & Borsari, S. (2013). Feature Analysis and Modeling of 670 nm Laser Optical Endpoint Traces in Tungsten CMP. IEEE Transactions on Semiconductor Manufacturing, 26(4), 542. https://doi.org/10.1109/TSM.2013.2271907

Chicago Style (17th ed.) Citation

Mazzone, Giovanni, Giuseppe Bano, Davide Michele Gianni, Luca Castelletti, and Silvia Borsari. "Feature Analysis and Modeling of 670 Nm Laser Optical Endpoint Traces in Tungsten CMP." IEEE Transactions on Semiconductor Manufacturing 26, no. 4 (2013): 542. https://doi.org/10.1109/TSM.2013.2271907.

MLA (9th ed.) Citation

Mazzone, Giovanni, et al. "Feature Analysis and Modeling of 670 Nm Laser Optical Endpoint Traces in Tungsten CMP." IEEE Transactions on Semiconductor Manufacturing, vol. 26, no. 4, 2013, p. 542, https://doi.org/10.1109/TSM.2013.2271907.