Ar (3P2) induced chemical vapor deposition of hydrogenated amorphous silicon.
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| Title: | Ar (3P2) induced chemical vapor deposition of hydrogenated amorphous silicon. |
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| Authors: | Toyoshima, Y., Kumata, K., Itoh, U., Arai, K., Matsuda, A., Washida, N., Inoue, G., Katsuumi, K. |
| Source: | Applied Physics Letters; 3/15/1985, Vol. 46 Issue 6, p584, 3p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00036951 |
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| DOI: | 10.1063/1.95914 |
