APA (7th ed.) Citation

Toyoshima, Y., Kumata, K., Itoh, U., Arai, K., Matsuda, A., Washida, N., . . . Katsuumi, K. (1985). Ar (3P2) induced chemical vapor deposition of hydrogenated amorphous silicon. Applied Physics Letters, 46(6), 584. https://doi.org/10.1063/1.95914

Chicago Style (17th ed.) Citation

Toyoshima, Y., K. Kumata, U. Itoh, K. Arai, A. Matsuda, N. Washida, G. Inoue, and K. Katsuumi. "Ar (3P2) Induced Chemical Vapor Deposition of Hydrogenated Amorphous Silicon." Applied Physics Letters 46, no. 6 (1985): 584. https://doi.org/10.1063/1.95914.

MLA (9th ed.) Citation

Toyoshima, Y., et al. "Ar (3P2) Induced Chemical Vapor Deposition of Hydrogenated Amorphous Silicon." Applied Physics Letters, vol. 46, no. 6, 1985, p. 584, https://doi.org/10.1063/1.95914.