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Ar (3P2) induced chemical vapor deposition of hydrogenated amorphous silicon.

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Bibliographic Details
Title: Ar (3P2) induced chemical vapor deposition of hydrogenated amorphous silicon.
Authors: Toyoshima, Y., Kumata, K., Itoh, U., Arai, K., Matsuda, A., Washida, N., Inoue, G., Katsuumi, K.
Source: Applied Physics Letters; 3/15/1985, Vol. 46 Issue 6, p584, 3p
Database: Applied Science & Technology Source
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