Microstructure of silicon implanted with high dose oxygen ions.
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| Title: | Microstructure of silicon implanted with high dose oxygen ions. |
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| Authors: | Jaussaud, C., Stoemenos, J., Margail, J., Dupuy, M., Blanchard, B., Bruel, M. |
| Source: | Applied Physics Letters; 6/1/1985, Vol. 46 Issue 11, p1064, 3p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00036951 |
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| DOI: | 10.1063/1.95761 |
