Barrier-limited surface diffusion in atom lithography.

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Bibliographic Details
Title: Barrier-limited surface diffusion in atom lithography.
Authors: te Sligte, E.1 e.t.sligte@tue.nl, van der Stam, K. M. R.1, Smeets, B.1, van der Straten, P.1, Scholten, R. E.1, Beijerinck, H. C. W.1, van Leeuwen, K. A. H.1
Source: Journal of Applied Physics. 2/15/2004, Vol. 95 Issue 4, p1749-1755. 7p. 2 Diagrams, 9 Graphs.
Database: Academic Search Ultimate
Description
ISSN:00218979
DOI:10.1063/1.1638613