APA (7th ed.) Citation

te Sligte, E., van der Stam, K. M. R., Smeets, B., van der Straten, P., Scholten, R. E., Beijerinck, H. C. W., & van Leeuwen, K. A. H. (2004). Barrier-limited surface diffusion in atom lithography. Journal of Applied Physics, 95(4), 1749. https://doi.org/10.1063/1.1638613

Chicago Style (17th ed.) Citation

te Sligte, E., K. M. R. van der Stam, B. Smeets, P. van der Straten, R. E. Scholten, H. C. W. Beijerinck, and K. A. H. van Leeuwen. "Barrier-limited Surface Diffusion in Atom Lithography." Journal of Applied Physics 95, no. 4 (2004): 1749. https://doi.org/10.1063/1.1638613.

MLA (9th ed.) Citation

te Sligte, E., et al. "Barrier-limited Surface Diffusion in Atom Lithography." Journal of Applied Physics, vol. 95, no. 4, 2004, p. 1749, https://doi.org/10.1063/1.1638613.