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Barrier-limited surface diffusion in atom lithography.

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Title: Barrier-limited surface diffusion in atom lithography.
Authors: te Sligte, E.1 e.t.sligte@tue.nl, van der Stam, K. M. R.1, Smeets, B.1, van der Straten, P.1, Scholten, R. E.1, Beijerinck, H. C. W.1, van Leeuwen, K. A. H.1
Source: Journal of Applied Physics. 2/15/2004, Vol. 95 Issue 4, p1749-1755. 7p. 2 Diagrams, 9 Graphs.
Database: Academic Search Ultimate
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Header DbId: asn
DbLabel: Academic Search Ultimate
An: 12105262
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Applied+Physics%22">Journal of Applied Physics</searchLink>. 2/15/2004, Vol. 95 Issue 4, p1749-1755. 7p. 2 Diagrams, 9 Graphs.
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=asn&AN=12105262
RecordInfo BibRecord:
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        Value: 10.1063/1.1638613
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      – Code: eng
        Text: English
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        PageCount: 7
        StartPage: 1749
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      – TitleFull: Barrier-limited surface diffusion in atom lithography.
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              Text: 2/15/2004
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              Y: 2004
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