APA (7th ed.) Citation

Lin, Y., Niu, J., Liu, W., & Tsai, J. (2021). Thermal Stability of HfO2|AlGaN|GaN Normally-Off Transistors with Ni|Au and Pt Gate Metals. Semiconductors, 55(7), 608. https://doi.org/10.1134/S1063782621070095

Chicago Style (17th ed.) Citation

Lin, Y.-C, J.-S Niu, W.-C Liu, and J.-H Tsai. "Thermal Stability of HfO2|AlGaN|GaN Normally-Off Transistors with Ni|Au and Pt Gate Metals." Semiconductors 55, no. 7 (2021): 608. https://doi.org/10.1134/S1063782621070095.

MLA (9th ed.) Citation

Lin, Y.-C, et al. "Thermal Stability of HfO2|AlGaN|GaN Normally-Off Transistors with Ni|Au and Pt Gate Metals." Semiconductors, vol. 55, no. 7, 2021, p. 608, https://doi.org/10.1134/S1063782621070095.