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Thermal Stability of HfO2|AlGaN|GaN Normally-Off Transistors with Ni|Au and Pt Gate Metals.

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Title: Thermal Stability of HfO2|AlGaN|GaN Normally-Off Transistors with Ni|Au and Pt Gate Metals.
Authors: Lin, Y.-C.1 (AUTHOR), Niu, J.-S.1 (AUTHOR), Liu, W.-C.1 (AUTHOR), Tsai, J.-H.2 (AUTHOR) jhtsai@nknucc.nknu.edu.tw
Source: Semiconductors. Jul2021, Vol. 55 Issue 7, p608-616. 9p.
Database: Academic Search Ultimate
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  Data: <searchLink fieldCode="JN" term="%22Semiconductors%22">Semiconductors</searchLink>. Jul2021, Vol. 55 Issue 7, p608-616. 9p.
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=asn&AN=155910831
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        Value: 10.1134/S1063782621070095
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      – Code: eng
        Text: English
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      – TitleFull: Thermal Stability of HfO2|AlGaN|GaN Normally-Off Transistors with Ni|Au and Pt Gate Metals.
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            NameFull: Niu, J.-S.
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              Text: Jul2021
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              Y: 2021
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