Thermal Stability of HfO2|AlGaN|GaN Normally-Off Transistors with Ni|Au and Pt Gate Metals.

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Bibliographic Details
Title: Thermal Stability of HfO2|AlGaN|GaN Normally-Off Transistors with Ni|Au and Pt Gate Metals.
Authors: Lin, Y.-C.1 (AUTHOR), Niu, J.-S.1 (AUTHOR), Liu, W.-C.1 (AUTHOR), Tsai, J.-H.2 (AUTHOR) jhtsai@nknucc.nknu.edu.tw
Source: Semiconductors. Jul2021, Vol. 55 Issue 7, p608-616. 9p.
Database: Academic Search Ultimate
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