Effect of C2H2F4/CF4O with low global warming potentials on SiNx etching as a CHF3 replacement.

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Title: Effect of C2H2F4/CF4O with low global warming potentials on SiNx etching as a CHF3 replacement.
Authors: Kim, Kyung Lim1,2 (AUTHOR), Hong, Jong Woo3 (AUTHOR), Jeon, Young Woo4 (AUTHOR), Jeong, Jun Won5 (AUTHOR), Kim, Chan Ho6 (AUTHOR), Eoh, Hyeong Joon6 (AUTHOR), Kim, Sung Hyun3 (AUTHOR), Park, Jong Soon1,2 (AUTHOR), Cho, Nam Il1,2 (AUTHOR), Kwak, Jung Hun7 (AUTHOR), Kim, Yongil8 (AUTHOR) yikim11@skku.edu, Yeom, Geun Young3,4 (AUTHOR) gyyeom@skku.edu
Source: Scientific Reports. 11/18/2025, Vol. 15 Issue 1, p1-10. 10p.
Database: Academic Search Ultimate
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ISSN:20452322
DOI:10.1038/s41598-025-24378-w