APA (7th ed.) Citation

Kim, K. L., Hong, J. W., Jeon, Y. W., Jeong, J. W., Kim, C. H., Eoh, H. J., . . . Yeom, G. Y. (2025). Effect of C2H2F4/CF4O with low global warming potentials on SiNx etching as a CHF3 replacement. Scientific Reports, 15(1), 1. https://doi.org/10.1038/s41598-025-24378-w

Chicago Style (17th ed.) Citation

Kim, Kyung Lim, et al. "Effect of C2H2F4/CF4O with Low Global Warming Potentials on SiNx Etching as a CHF3 Replacement." Scientific Reports 15, no. 1 (2025): 1. https://doi.org/10.1038/s41598-025-24378-w.

MLA (9th ed.) Citation

Kim, Kyung Lim, et al. "Effect of C2H2F4/CF4O with Low Global Warming Potentials on SiNx Etching as a CHF3 Replacement." Scientific Reports, vol. 15, no. 1, 2025, p. 1, https://doi.org/10.1038/s41598-025-24378-w.