In Situ GISAXS Study of IZO Deposition via Magnetron Sputtering for Optoelectronic Devices: Film Growth and Ion Bombardment‐Induced Degradation Dynamics.

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Title: In Situ GISAXS Study of IZO Deposition via Magnetron Sputtering for Optoelectronic Devices: Film Growth and Ion Bombardment‐Induced Degradation Dynamics.
Authors: Zhong, Huaying1 (AUTHOR), Härtel, Marlene Sophie2 (AUTHOR), Chen, Wei3 (AUTHOR), Spanier, Lukas V.1 (AUTHOR), Yin, Shanshan4 (AUTHOR), Zhang, Jiahuan2 (AUTHOR), Seibertz, Bertwin Bilgrim Otto5 (AUTHOR), Szyszka, Bernd5 (AUTHOR), Albrecht, Steve2,5 (AUTHOR), Schwartzkopf, Matthias6 (AUTHOR), Roth, Stephan V.6,7 (AUTHOR), Müller‐Buschbaum, Peter1 (AUTHOR) muellerb@ph.tum.de
Source: Advanced Science. 1/27/2026, Vol. 13 Issue 5, p1-14. 14p.
Database: Academic Search Ultimate
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ISSN:21983844
DOI:10.1002/advs.202516853