Topical Ideal Sized Chitosan Dressing to Reduce Folliculitis After Microneedling, RF Microneedling, and Fractional CO2 Laser Resurfacing.
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| Title: | Topical Ideal Sized Chitosan Dressing to Reduce Folliculitis After Microneedling, RF Microneedling, and Fractional CO |
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| Authors: | Lee, Suyeon1 (AUTHOR), Park, Soo Yeon2 (AUTHOR), Choi, Wonseok3 (AUTHOR), Shin, Jiyeon4 (AUTHOR), Yi, Kyuho5 (AUTHOR) kyuho90@daum.net |
| Source: | Journal of Cosmetic Dermatology. Jun2026, Vol. 25 Issue 6, p1-5. 5p. |
| Database: | Academic Search Ultimate |
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| ISSN: | 14732130 |
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| DOI: | 10.1111/jocd.70901 |