APA (7th ed.) Citation

Lee, S., Park, S. Y., Choi, W., Shin, J., & Yi, K. (2026). Topical Ideal Sized Chitosan Dressing to Reduce Folliculitis After Microneedling, RF Microneedling, and Fractional CO2 Laser Resurfacing. Journal of Cosmetic Dermatology, 25(6), 1. https://doi.org/10.1111/jocd.70901

Chicago Style (17th ed.) Citation

Lee, Suyeon, Soo Yeon Park, Wonseok Choi, Jiyeon Shin, and Kyuho Yi. "Topical Ideal Sized Chitosan Dressing to Reduce Folliculitis After Microneedling, RF Microneedling, and Fractional CO2 Laser Resurfacing." Journal of Cosmetic Dermatology 25, no. 6 (2026): 1. https://doi.org/10.1111/jocd.70901.

MLA (9th ed.) Citation

Lee, Suyeon, et al. "Topical Ideal Sized Chitosan Dressing to Reduce Folliculitis After Microneedling, RF Microneedling, and Fractional CO2 Laser Resurfacing." Journal of Cosmetic Dermatology, vol. 25, no. 6, 2026, p. 1, https://doi.org/10.1111/jocd.70901.