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Topical Ideal Sized Chitosan Dressing to Reduce Folliculitis After Microneedling, RF Microneedling, and Fractional CO2 Laser Resurfacing.

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Title: Topical Ideal Sized Chitosan Dressing to Reduce Folliculitis After Microneedling, RF Microneedling, and Fractional CO2 Laser Resurfacing.
Authors: Lee, Suyeon1 (AUTHOR), Park, Soo Yeon2 (AUTHOR), Choi, Wonseok3 (AUTHOR), Shin, Jiyeon4 (AUTHOR), Yi, Kyuho5 (AUTHOR) kyuho90@daum.net
Source: Journal of Cosmetic Dermatology. Jun2026, Vol. 25 Issue 6, p1-5. 5p.
Database: Academic Search Ultimate
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  Data: Topical Ideal Sized Chitosan Dressing to Reduce Folliculitis After Microneedling, RF Microneedling, and Fractional CO<subscript>2</subscript> Laser Resurfacing.
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Cosmetic+Dermatology%22">Journal of Cosmetic Dermatology</searchLink>. Jun2026, Vol. 25 Issue 6, p1-5. 5p.
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=asn&AN=194784455
RecordInfo BibRecord:
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      – Type: doi
        Value: 10.1111/jocd.70901
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      – Code: eng
        Text: English
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      Pagination:
        PageCount: 5
        StartPage: 1
    Titles:
      – TitleFull: Topical Ideal Sized Chitosan Dressing to Reduce Folliculitis After Microneedling, RF Microneedling, and Fractional CO2 Laser Resurfacing.
        Type: main
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          Name:
            NameFull: Lee, Suyeon
      – PersonEntity:
          Name:
            NameFull: Park, Soo Yeon
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            NameFull: Choi, Wonseok
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          Name:
            NameFull: Shin, Jiyeon
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            NameFull: Yi, Kyuho
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          Dates:
            – D: 01
              M: 06
              Text: Jun2026
              Type: published
              Y: 2026
          Identifiers:
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              Value: 14732130
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              Value: 25
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              Value: 6
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            – TitleFull: Journal of Cosmetic Dermatology
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