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Sequential sputtered Co-HfO2 granular films.

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Title: Sequential sputtered Co-HfO2 granular films.
Authors: Chadha, M.1, Ng, V.1
Source: Journal of Magnetism & Magnetic Materials. Mar2017, Vol. 426, p302-309. 8p.
Subjects: Cobalt compounds, Magnetron sputtering, Hafnium oxide films, Ferromagnetism, Metal microstructure
Abstract: A systematic study of magnetic, magneto-transport and micro-structural properties of Co-HfO 2 granular films fabricated by sequential sputtering is presented. We demonstrate reduction in ferromagnetic-oxide formation by using HfO 2 as the insulting matrix. Microstructure evaluation of the films showed that the film structure consisted of discrete hcp-Co grains embedded in HfO 2 matrix. Films with varying compositions were prepared and their macroscopic properties were studied. We correlate the variation in these properties to the variation in film microstructure. Our study shows that Co-HfO 2 films with reduced cobalt oxide and varying properties can be prepared using sequential sputtering technique. [ABSTRACT FROM AUTHOR]
Copyright of Journal of Magnetism & Magnetic Materials is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
Database: Engineering Source
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  Availability: 0
Header DbId: egs
DbLabel: Engineering Source
An: 120797601
AccessLevel: 6
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
IllustrationInfo
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  Label: Title
  Group: Ti
  Data: Sequential sputtered Co-HfO2 granular films.
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  Data: <searchLink fieldCode="AR" term="%22Chadha%2C+M%2E%22">Chadha, M.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Ng%2C+V%2E%22">Ng, V.</searchLink><relatesTo>1</relatesTo>
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Magnetism+%26+Magnetic+Materials%22">Journal of Magnetism & Magnetic Materials</searchLink>. Mar2017, Vol. 426, p302-309. 8p.
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  Data: <searchLink fieldCode="DE" term="%22Cobalt+compounds%22">Cobalt compounds</searchLink><br /><searchLink fieldCode="DE" term="%22Magnetron+sputtering%22">Magnetron sputtering</searchLink><br /><searchLink fieldCode="DE" term="%22Hafnium+oxide+films%22">Hafnium oxide films</searchLink><br /><searchLink fieldCode="DE" term="%22Ferromagnetism%22">Ferromagnetism</searchLink><br /><searchLink fieldCode="DE" term="%22Metal+microstructure%22">Metal microstructure</searchLink>
– Name: Abstract
  Label: Abstract
  Group: Ab
  Data: A systematic study of magnetic, magneto-transport and micro-structural properties of Co-HfO 2 granular films fabricated by sequential sputtering is presented. We demonstrate reduction in ferromagnetic-oxide formation by using HfO 2 as the insulting matrix. Microstructure evaluation of the films showed that the film structure consisted of discrete hcp-Co grains embedded in HfO 2 matrix. Films with varying compositions were prepared and their macroscopic properties were studied. We correlate the variation in these properties to the variation in film microstructure. Our study shows that Co-HfO 2 films with reduced cobalt oxide and varying properties can be prepared using sequential sputtering technique. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Journal of Magnetism & Magnetic Materials is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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RecordInfo BibRecord:
  BibEntity:
    Identifiers:
      – Type: doi
        Value: 10.1016/j.jmmm.2016.11.094
    Languages:
      – Code: eng
        Text: English
    PhysicalDescription:
      Pagination:
        PageCount: 8
        StartPage: 302
    Subjects:
      – SubjectFull: Cobalt compounds
        Type: general
      – SubjectFull: Magnetron sputtering
        Type: general
      – SubjectFull: Hafnium oxide films
        Type: general
      – SubjectFull: Ferromagnetism
        Type: general
      – SubjectFull: Metal microstructure
        Type: general
    Titles:
      – TitleFull: Sequential sputtered Co-HfO2 granular films.
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            NameFull: Chadha, M.
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            NameFull: Ng, V.
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              M: 03
              Text: Mar2017
              Type: published
              Y: 2017
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              Value: 426
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            – TitleFull: Journal of Magnetism & Magnetic Materials
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