INSIDE THE MOST COMPLICATED MACHINE ON THE PLANET.

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Bibliographic Details
Title: INSIDE THE MOST COMPLICATED MACHINE ON THE PLANET.
Authors: Thompson, Clive (AUTHOR)
Source: MIT Technology Review. Nov/Dec2021, Vol. 124 Issue 6, p44-55. 12p. 12 Color Photographs.
Subjects: Extreme ultraviolet lithography, Integrated circuits manufacturing, ASML Holding NV, Intel Corp., Moore's law
Abstract: The article profiles the ASML company's extreme ultraviolet (EUV) lithography equipment used for the manufacture of integrated circuits at the Intel company. The history of EUV lithography is reviewed within the context of Moore's Law, the importance of specially polished high precision mirrors in EUV equipment is emphasized, and the prevention of EUV technology being supplied to China is described.
Database: Engineering Source
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Abstract:The article profiles the ASML company's extreme ultraviolet (EUV) lithography equipment used for the manufacture of integrated circuits at the Intel company. The history of EUV lithography is reviewed within the context of Moore's Law, the importance of specially polished high precision mirrors in EUV equipment is emphasized, and the prevention of EUV technology being supplied to China is described.
ISSN:2749649X