Lead-free dielectric thin films: Synthesis of Ag(Nb1−xTax)O3 via reactive dc magnetron sputtering.

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Title: Lead-free dielectric thin films: Synthesis of Ag(Nb1−xTax)O3 via reactive dc magnetron sputtering.
Authors: Kölbl, L.1 (AUTHOR) lukas.koelbl@unileoben.ac.at, Mehrabi, M.1 (AUTHOR), Griesser, T.2 (AUTHOR), Munnik, F.3 (AUTHOR), Mitterer, C.1 (AUTHOR)
Source: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films. Jan2025, Vol. 43 Issue 1, p1-11. 11p.
Subjects: Dielectric thin films, Thin film deposition, Energy dispersive X-ray spectroscopy, Thin films, X-ray photoelectron spectroscopy, Rutherford backscattering spectrometry, Magnetron sputtering
Abstract: Growing environmental concerns have driven the switch from lead-containing dielectric perovskite ceramics to lead-free alternatives such as silver niobate tantalate [Ag(Nb1−xTax)O3], where tantalum (Ta) substitution for niobium (Nb) enhances energy-storage density. Thin film deposition presents a promising way for fabricating these materials for use in capacitors. In this study, Ag(Nb1−xTax)O3 (0 ≤ x ≤ 0.5) thin films are synthesized via combinatorial reactive dc magnetron sputtering from metallic targets. The chemical and phase compositions of the films are comprehensively analyzed using scanning electron microscopy coupled with energy dispersive x-ray spectroscopy, elastic recoil detection analysis, Rutherford backscattering spectrometry, x-ray diffraction, Raman spectroscopy, and x-ray photoelectron spectroscopy. The findings demonstrate that reactive dc magnetron sputtering is a feasible technique for producing complex perovskite oxide thin films with customized chemical composition and microstructure. By enhancing the understanding of the Ag(Nb1−xTax)O3 material system, this study aims to contribute to the development of environmentally benign high-performance dielectrics that could replace lead-based ceramics in energy-storage applications. [ABSTRACT FROM AUTHOR]
Copyright of Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films is the property of American Institute of Physics and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
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  Data: <searchLink fieldCode="DE" term="%22Dielectric+thin+films%22">Dielectric thin films</searchLink><br /><searchLink fieldCode="DE" term="%22Thin+film+deposition%22">Thin film deposition</searchLink><br /><searchLink fieldCode="DE" term="%22Energy+dispersive+X-ray+spectroscopy%22">Energy dispersive X-ray spectroscopy</searchLink><br /><searchLink fieldCode="DE" term="%22Thin+films%22">Thin films</searchLink><br /><searchLink fieldCode="DE" term="%22X-ray+photoelectron+spectroscopy%22">X-ray photoelectron spectroscopy</searchLink><br /><searchLink fieldCode="DE" term="%22Rutherford+backscattering+spectrometry%22">Rutherford backscattering spectrometry</searchLink><br /><searchLink fieldCode="DE" term="%22Magnetron+sputtering%22">Magnetron sputtering</searchLink>
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  Data: Growing environmental concerns have driven the switch from lead-containing dielectric perovskite ceramics to lead-free alternatives such as silver niobate tantalate [Ag(Nb1−xTax)O3], where tantalum (Ta) substitution for niobium (Nb) enhances energy-storage density. Thin film deposition presents a promising way for fabricating these materials for use in capacitors. In this study, Ag(Nb1−xTax)O3 (0 ≤ x ≤ 0.5) thin films are synthesized via combinatorial reactive dc magnetron sputtering from metallic targets. The chemical and phase compositions of the films are comprehensively analyzed using scanning electron microscopy coupled with energy dispersive x-ray spectroscopy, elastic recoil detection analysis, Rutherford backscattering spectrometry, x-ray diffraction, Raman spectroscopy, and x-ray photoelectron spectroscopy. The findings demonstrate that reactive dc magnetron sputtering is a feasible technique for producing complex perovskite oxide thin films with customized chemical composition and microstructure. By enhancing the understanding of the Ag(Nb1−xTax)O3 material system, this study aims to contribute to the development of environmentally benign high-performance dielectrics that could replace lead-based ceramics in energy-storage applications. [ABSTRACT FROM AUTHOR]
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  Data: <i>Copyright of Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films is the property of American Institute of Physics and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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RecordInfo BibRecord:
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      – Type: doi
        Value: 10.1116/6.0004162
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      – Code: eng
        Text: English
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      Pagination:
        PageCount: 11
        StartPage: 1
    Subjects:
      – SubjectFull: Dielectric thin films
        Type: general
      – SubjectFull: Thin film deposition
        Type: general
      – SubjectFull: Energy dispersive X-ray spectroscopy
        Type: general
      – SubjectFull: Thin films
        Type: general
      – SubjectFull: X-ray photoelectron spectroscopy
        Type: general
      – SubjectFull: Rutherford backscattering spectrometry
        Type: general
      – SubjectFull: Magnetron sputtering
        Type: general
    Titles:
      – TitleFull: Lead-free dielectric thin films: Synthesis of Ag(Nb1−xTax)O3 via reactive dc magnetron sputtering.
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          Name:
            NameFull: Kölbl, L.
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            NameFull: Mehrabi, M.
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            NameFull: Griesser, T.
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            NameFull: Munnik, F.
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            NameFull: Mitterer, C.
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            – D: 01
              M: 01
              Text: Jan2025
              Type: published
              Y: 2025
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              Value: 07342101
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              Value: 43
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            – TitleFull: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films
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