Large-Area Pulsed Laser Deposition Growth of Transparent Conductive Al-Doped ZnO Thin Films.
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| Title: | Large-Area Pulsed Laser Deposition Growth of Transparent Conductive Al-Doped ZnO Thin Films. |
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| Authors: | Bancu, Elena Isabela1,2 (AUTHOR), Ion, Valentin1,2 (AUTHOR), Sopronyi, Mihai Adrian1,3 (AUTHOR), Antohe, Stefan1,2,3 (AUTHOR), Scarisoreanu, Nicu Doinel1,2 (AUTHOR) nicu.scarisoreanu@inflpr.ro |
| Source: | Nanomaterials (2079-4991). Nov2025, Vol. 15 Issue 22, p1722. 15p. |
| Subjects: | Pulsed laser deposition, Thin films, Morphology, Electric properties, Microfabrication, Zinc oxide films, Optical properties |
| Abstract: | High-quality AZO thin films were produced on a 4-inch Si substrate using large-area PLD equipment at a substrate temperature of 330 °C, with a ZnO: Al (98:2 wt.%) target. This study aims to enhance the electrical, optical, morphological and structural properties of large-area PLD-grown AZO thin films by tuning the deposition pressures. The samples were prepared under high-vacuum (HV) conditions, as well as in oxygen atmospheres of 0.005 mbar O2, 0.01 mbar O2, and 0.1 mbar O2. Consequently, a bilayer AZO film was prepared in a combination of two deposition pressures (first layer prepared under HV, followed by the second layer prepared at 0.01 mbar O2). Additionally, morphological and structural characterization revealed that high-quality columnar growth AZO thin films free of droplets, with a strong (002) orientation, were achieved on a 4-inch Si substrate. Moreover, Hall measurements in the Van der Pauw configuration were used to assess the electrical properties. A low electrical resistivity of 3.98 × 10−4 Ω cm, combined with a high carrier concentration (n) of 1.05 × 1021 cm−3 and a charge carrier mobility of 17.9 cm2/V s, was achieved at room temperature for the sample prepared under HV conditions. The optical characterization conducted through spectroscopic ellipsometry measurements showed that the large-area AZO sample exhibits an increased optical transparency in the visible (VIS) range with a near-zero extinction coefficient (k) and a wide bandgap of 3.75 eV, fulfilling the standards for materials classified as TCO. In addition, the increased thickness uniformity of the prepared AZO films over a large area represents a significant step in scaling the PLD technique for industrial applications. [ABSTRACT FROM AUTHOR] |
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| Database: | Engineering Source |
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| Abstract: | High-quality AZO thin films were produced on a 4-inch Si substrate using large-area PLD equipment at a substrate temperature of 330 °C, with a ZnO: Al (98:2 wt.%) target. This study aims to enhance the electrical, optical, morphological and structural properties of large-area PLD-grown AZO thin films by tuning the deposition pressures. The samples were prepared under high-vacuum (HV) conditions, as well as in oxygen atmospheres of 0.005 mbar O2, 0.01 mbar O2, and 0.1 mbar O2. Consequently, a bilayer AZO film was prepared in a combination of two deposition pressures (first layer prepared under HV, followed by the second layer prepared at 0.01 mbar O2). Additionally, morphological and structural characterization revealed that high-quality columnar growth AZO thin films free of droplets, with a strong (002) orientation, were achieved on a 4-inch Si substrate. Moreover, Hall measurements in the Van der Pauw configuration were used to assess the electrical properties. A low electrical resistivity of 3.98 × 10−4 Ω cm, combined with a high carrier concentration (n) of 1.05 × 1021 cm−3 and a charge carrier mobility of 17.9 cm2/V s, was achieved at room temperature for the sample prepared under HV conditions. The optical characterization conducted through spectroscopic ellipsometry measurements showed that the large-area AZO sample exhibits an increased optical transparency in the visible (VIS) range with a near-zero extinction coefficient (k) and a wide bandgap of 3.75 eV, fulfilling the standards for materials classified as TCO. In addition, the increased thickness uniformity of the prepared AZO films over a large area represents a significant step in scaling the PLD technique for industrial applications. [ABSTRACT FROM AUTHOR] |
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| ISSN: | 20794991 |
| DOI: | 10.3390/nano15221722 |
