Stitch-Less Lithography Empowered by Multi-Dimensional Holography.
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| Title: | Stitch-Less Lithography Empowered by Multi-Dimensional Holography. |
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| Authors: | Huang, Hsin-Hui1,2,3 (AUTHOR) haoranmu@swin.edu.au, Mu, Haoran1,2,3 (AUTHOR), Puig Vilardell, Eulalia3,4,5 (AUTHOR), Anand, Vijayakumar1,4 (AUTHOR), Gailevičius, Darius4,5 (AUTHOR), Juodkazis, Saulius1,4,6 (AUTHOR) sjuodkazis@swin.edu.au |
| Source: | Nanomaterials (2079-4991). Jun2026, Vol. 16 Issue 11, p692. 18p. |
| Abstract: | Trends in Micro- and Nano-Lithography required for future development of large area applications ranging from high-packing-density electronics to solar cells are surveyed and outlined. Strategies to use direct laser writing to define etch masks over large areas by: (i) fixed beam moving stage and (ii) moving beam moving stage approaches are presented. The extension of planar 2D and stacked 2D (or 2.5D) fabrication methods into 3D micro- and nano-fabrication is discussed. One of the essential future characteristics of 3D nanolithography is real-time feedback capability. This can be realised via inherent 3D-capable holography, which bridges lithographic exposure control, wavefront sensing, and adaptive feedback, providing a pathway to stitch-free, large-area 3D patterning. The future of micro-fabrication is expected to evolve via highly specialised 3D architecture design and reduction in post-processing steps. [ABSTRACT FROM AUTHOR] |
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| Database: | Engineering Source |
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| Abstract: | Trends in Micro- and Nano-Lithography required for future development of large area applications ranging from high-packing-density electronics to solar cells are surveyed and outlined. Strategies to use direct laser writing to define etch masks over large areas by: (i) fixed beam moving stage and (ii) moving beam moving stage approaches are presented. The extension of planar 2D and stacked 2D (or 2.5D) fabrication methods into 3D micro- and nano-fabrication is discussed. One of the essential future characteristics of 3D nanolithography is real-time feedback capability. This can be realised via inherent 3D-capable holography, which bridges lithographic exposure control, wavefront sensing, and adaptive feedback, providing a pathway to stitch-free, large-area 3D patterning. The future of micro-fabrication is expected to evolve via highly specialised 3D architecture design and reduction in post-processing steps. [ABSTRACT FROM AUTHOR] |
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| ISSN: | 20794991 |
| DOI: | 10.3390/nano16110692 |
