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Stitch-Less Lithography Empowered by Multi-Dimensional Holography.

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Title: Stitch-Less Lithography Empowered by Multi-Dimensional Holography.
Authors: Huang, Hsin-Hui1,2,3 (AUTHOR) haoranmu@swin.edu.au, Mu, Haoran1,2,3 (AUTHOR), Puig Vilardell, Eulalia3,4,5 (AUTHOR), Anand, Vijayakumar1,4 (AUTHOR), Gailevičius, Darius4,5 (AUTHOR), Juodkazis, Saulius1,4,6 (AUTHOR) sjuodkazis@swin.edu.au
Source: Nanomaterials (2079-4991). Jun2026, Vol. 16 Issue 11, p692. 18p.
Subjects: Nanolithography, Holography, Photolithography, Microfabrication, Adaptive control systems, Wavefront sensors
Abstract: Trends in Micro- and Nano-Lithography required for future development of large area applications ranging from high-packing-density electronics to solar cells are surveyed and outlined. Strategies to use direct laser writing to define etch masks over large areas by: (i) fixed beam moving stage and (ii) moving beam moving stage approaches are presented. The extension of planar 2D and stacked 2D (or 2.5D) fabrication methods into 3D micro- and nano-fabrication is discussed. One of the essential future characteristics of 3D nanolithography is real-time feedback capability. This can be realised via inherent 3D-capable holography, which bridges lithographic exposure control, wavefront sensing, and adaptive feedback, providing a pathway to stitch-free, large-area 3D patterning. The future of micro-fabrication is expected to evolve via highly specialised 3D architecture design and reduction in post-processing steps. [ABSTRACT FROM AUTHOR]
Copyright of Nanomaterials (2079-4991) is the property of MDPI and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
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  Data: Stitch-Less Lithography Empowered by Multi-Dimensional Holography.
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  Data: <searchLink fieldCode="AR" term="%22Huang%2C+Hsin-Hui%22">Huang, Hsin-Hui</searchLink><relatesTo>1,2,3</relatesTo> (AUTHOR)<i> haoranmu@swin.edu.au</i><br /><searchLink fieldCode="AR" term="%22Mu%2C+Haoran%22">Mu, Haoran</searchLink><relatesTo>1,2,3</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Puig+Vilardell%2C+Eulalia%22">Puig Vilardell, Eulalia</searchLink><relatesTo>3,4,5</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Anand%2C+Vijayakumar%22">Anand, Vijayakumar</searchLink><relatesTo>1,4</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Gailevičius%2C+Darius%22">Gailevičius, Darius</searchLink><relatesTo>4,5</relatesTo> (AUTHOR)<br /><searchLink fieldCode="AR" term="%22Juodkazis%2C+Saulius%22">Juodkazis, Saulius</searchLink><relatesTo>1,4,6</relatesTo> (AUTHOR)<i> sjuodkazis@swin.edu.au</i>
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  Data: <searchLink fieldCode="JN" term="%22Nanomaterials+%282079-4991%29%22">Nanomaterials (2079-4991)</searchLink>. Jun2026, Vol. 16 Issue 11, p692. 18p.
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  Data: <searchLink fieldCode="DE" term="%22Nanolithography%22">Nanolithography</searchLink><br /><searchLink fieldCode="DE" term="%22Holography%22">Holography</searchLink><br /><searchLink fieldCode="DE" term="%22Photolithography%22">Photolithography</searchLink><br /><searchLink fieldCode="DE" term="%22Microfabrication%22">Microfabrication</searchLink><br /><searchLink fieldCode="DE" term="%22Adaptive+control+systems%22">Adaptive control systems</searchLink><br /><searchLink fieldCode="DE" term="%22Wavefront+sensors%22">Wavefront sensors</searchLink>
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  Data: Trends in Micro- and Nano-Lithography required for future development of large area applications ranging from high-packing-density electronics to solar cells are surveyed and outlined. Strategies to use direct laser writing to define etch masks over large areas by: (i) fixed beam moving stage and (ii) moving beam moving stage approaches are presented. The extension of planar 2D and stacked 2D (or 2.5D) fabrication methods into 3D micro- and nano-fabrication is discussed. One of the essential future characteristics of 3D nanolithography is real-time feedback capability. This can be realised via inherent 3D-capable holography, which bridges lithographic exposure control, wavefront sensing, and adaptive feedback, providing a pathway to stitch-free, large-area 3D patterning. The future of micro-fabrication is expected to evolve via highly specialised 3D architecture design and reduction in post-processing steps. [ABSTRACT FROM AUTHOR]
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  Label:
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  Data: <i>Copyright of Nanomaterials (2079-4991) is the property of MDPI and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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        Value: 10.3390/nano16110692
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      – Code: eng
        Text: English
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        PageCount: 18
        StartPage: 692
    Subjects:
      – SubjectFull: Nanolithography
        Type: general
      – SubjectFull: Holography
        Type: general
      – SubjectFull: Photolithography
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      – SubjectFull: Microfabrication
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      – SubjectFull: Wavefront sensors
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      – TitleFull: Stitch-Less Lithography Empowered by Multi-Dimensional Holography.
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            NameFull: Huang, Hsin-Hui
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            NameFull: Mu, Haoran
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            NameFull: Puig Vilardell, Eulalia
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            – D: 01
              M: 06
              Text: Jun2026
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              Y: 2026
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