Bibliographic Details
| Title: |
Radiation induced generation of non-bridging oxygen hole center in silica: Intrinsic and extrinsic processes |
| Authors: |
Vaccaro, L.1 lavinia.vaccaro@fisica.unipa.it, Cannas, M.1, Boizot, B.2, Parlato, A.3 |
| Source: |
Journal of Non-Crystalline Solids. Apr2007, Vol. 353 Issue 5-7, p586-589. 4p. |
| Subjects: |
Silicon compounds, Photosynthetic oxygen evolution, Light sources, Fused silica |
| Abstract: |
Abstract: The generation of non-bridging oxygen hole center (;O ) was investigated in a wide variety of natural (fused quartz) and synthetic silica samples exposed to different γ- and β-irradiation doses by looking at its optical bands. We distinguish two different generation processes: intrinsic associated with the cleavage of Si–O bond and characterized by a sublinear law and extrinsic due to the conversion of OH precursor characterized by a growth curve with a saturating tendency. The interplay between the two processes and the role of H are discussed. [Copyright &y& Elsevier] |
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| Database: |
Engineering Source |
