Direct observation of a Ti/Cu interface with atomic displacement under electron irradiation.
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| Title: | Direct observation of a Ti/Cu interface with atomic displacement under electron irradiation. |
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| Authors: | Ohta, S.1, Sakaguchi, N.2, Shibayama, T.2, Takahashi, H.2 |
| Source: | Journal of Microscopy. Jul2001, Vol. 203 Issue 1, p34-39. 6p. 4 Black and White Photographs, 1 Diagram, 2 Graphs. |
| Subjects: | Interfaces (Physical sciences), Irradiation, Titanium, Copper, In situ bioremediation |
| Abstract: | A Ti film was deposited onto a Cu substrate by means of a radio frequency magnetron sputtering method. Cross-sectional thin foils for TEM observation were prepared using a focused ion beam. Electron irradiation was carried out using a high-resolution high-voltage electron microscope operated at 1.25 MV. The Cu/Ti interface of the foils was irradiated at 623 K. In-situ observation images during electron irradiation were recorded by a CCD camera with a digital video cassette. The (020)Cu plane on the Cu/Ti interface preferentially moved towards the Ti film with irradiation. Composition analysis of the diffused region showed that its composition corresponded to Ti3Cu2. [ABSTRACT FROM AUTHOR] |
| Copyright of Journal of Microscopy is the property of Wiley-Blackwell and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.) | |
| Database: | Engineering Source |
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| Abstract: | A Ti film was deposited onto a Cu substrate by means of a radio frequency magnetron sputtering method. Cross-sectional thin foils for TEM observation were prepared using a focused ion beam. Electron irradiation was carried out using a high-resolution high-voltage electron microscope operated at 1.25 MV. The Cu/Ti interface of the foils was irradiated at 623 K. In-situ observation images during electron irradiation were recorded by a CCD camera with a digital video cassette. The (020)Cu plane on the Cu/Ti interface preferentially moved towards the Ti film with irradiation. Composition analysis of the diffused region showed that its composition corresponded to Ti3Cu2. [ABSTRACT FROM AUTHOR] |
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| ISSN: | 00222720 |
| DOI: | 10.1046/j.1365-2818.2001.00912.x |
