Bibliographic Details
| Title: |
Deposition dynamics of droplet-free Si nanoparticles in Ar gas using laser ablation |
| Authors: |
Takeuchi, D.1 take@ims.tsukuba.ac.jp, Mizuta, T.1, Makimura, T.1, Yoshida, S.1, Fujita, M.1, Hata, K.2, Shigekawa, H.1, Murakami, K.1 |
| Source: |
Applied Surface Science. Sep2002, Vol. 197/198 Issue 1-4, p674. 5p. |
| Subjects: |
Electric properties of silicon crystals, Pulsed laser deposition, Time-resolved spectroscopy, Nanoparticles |
| Abstract: |
Droplet-free deposition of Si nanoparticle films has been studied applying time-resolved imaging of Si nanoparticles formed by laser ablation of Si targets in Ar gas. We found that Si nanoparticles can be deposited not only on substrates facing to the targets but also on substrates placed beside the target. We further confirmed using a scanning tunneling microscope (STM), Si nanoparticles with sizes of 5–8 nm are deposited on substrates placed beside the target and using a scanning electron microscope (SEM) on the substrates, no droplets are observed. [Copyright &y& Elsevier] |
|
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| Database: |
Engineering Source |
