APA (7th ed.) Citation

Takeuchi, D., Mizuta, T., Makimura, T., Yoshida, S., Fujita, M., Hata, K., . . . Murakami, K. (2002). Deposition dynamics of droplet-free Si nanoparticles in Ar gas using laser ablation. Applied Surface Science, 197/198(1-4), 674. https://doi.org/10.1016/S0169-4332(02)00439-7

Chicago Style (17th ed.) Citation

Takeuchi, D., T. Mizuta, T. Makimura, S. Yoshida, M. Fujita, K. Hata, H. Shigekawa, and K. Murakami. "Deposition Dynamics of Droplet-free Si Nanoparticles in Ar Gas Using Laser Ablation." Applied Surface Science 197/198, no. 1-4 (2002): 674. https://doi.org/10.1016/S0169-4332(02)00439-7.

MLA (9th ed.) Citation

Takeuchi, D., et al. "Deposition Dynamics of Droplet-free Si Nanoparticles in Ar Gas Using Laser Ablation." Applied Surface Science, vol. 197/198, no. 1-4, 2002, p. 674, https://doi.org/10.1016/S0169-4332(02)00439-7.