APA (7th ed.) Citation

Kuwahara, M., Kim, J., & Tominaga, J. (2003). Dot formation with 170-nm dimensions using a thermal lithography technique. Microelectronic Engineering, 67/68, 651. https://doi.org/10.1016/S0167-9317(03)00127-8

Chicago Style (17th ed.) Citation

Kuwahara, M., J.H Kim, and J. Tominaga. "Dot Formation with 170-nm Dimensions Using a Thermal Lithography Technique." Microelectronic Engineering 67/68 (2003): 651. https://doi.org/10.1016/S0167-9317(03)00127-8.

MLA (9th ed.) Citation

Kuwahara, M., et al. "Dot Formation with 170-nm Dimensions Using a Thermal Lithography Technique." Microelectronic Engineering, vol. 67/68, 2003, p. 651, https://doi.org/10.1016/S0167-9317(03)00127-8.