Bibliographic Details
| Title: |
Atomic layer-deposited tunnel oxide stabilizes silicon photoanodes for water oxidation. |
| Authors: |
Chen YW; Department of Materials Science & Engineering, Stanford University, Stanford, California 94305, USA., Prange JD, Dühnen S, Park Y, Gunji M, Chidsey CE, McIntyre PC |
| Source: |
Nature materials [Nat Mater] 2011 Jun 19; Vol. 10 (7), pp. 539-44. Date of Electronic Publication: 2011 Jun 19. |
| Publication Type: |
Journal Article |
| Journal Info: |
Publisher: Nature Pub. Group Country of Publication: England NLM ID: 101155473 Publication Model: Electronic Cited Medium: Internet ISSN: 1476-4660 (Electronic) Linking ISSN: 14761122 NLM ISO Abbreviation: Nat Mater Subsets: PubMed not MEDLINE |
| Database: |
MEDLINE Ultimate |
