| Authors: |
Kugo Y; Graduate School of Chemical Sciences and Engineering, Hokkaido University, N13W8, Kita-ku, Sapporo 060-8628, Japan. Electronic address: kugo2318@eis.hokudai.ac.jp., Nomura S; Graduate School of Chemical Sciences and Engineering, Hokkaido University, N13W8, Kita-ku, Sapporo 060-8628, Japan., Isono T; Faculty of Engineering, Hokkaido University, N13W8, Kita-ku, Sapporo 060-8628, Japan. Electronic address: isono.t@eng.hokudai.ac.jp., Sato SI; Faculty of Engineering, Hokkaido University, N13W8, Kita-ku, Sapporo 060-8628, Japan. Electronic address: s-sato@eng.hokudai.ac.jp., Fujiwara M; Faculty of Engineering, Hokkaido University, N13W8, Kita-ku, Sapporo 060-8628, Japan. Electronic address: fujiwara@icredd.hokudai.ac.jp., Satoh T; Faculty of Engineering, Hokkaido University, N13W8, Kita-ku, Sapporo 060-8628, Japan; ICReDD List-PF, Hokkaido University, N21W10, Kita-ku, Sapporo 001-0021, Japan. Electronic address: satoh@eng.hokudai.ac.jp., Tani H; Faculty of Engineering, Hokkaido University, N13W8, Kita-ku, Sapporo 060-8628, Japan. Electronic address: tani@eng.hokudai.ac.jp., Erata T; Faculty of Engineering, Hokkaido University, N13W8, Kita-ku, Sapporo 060-8628, Japan. Electronic address: erata@eng.hokudai.ac.jp., Tajima K; Faculty of Engineering, Hokkaido University, N13W8, Kita-ku, Sapporo 060-8628, Japan. Electronic address: ktajima@eng.hokudai.ac.jp. |
