Low Resistivity and High Carrier Concentration in SnO2 Thin Films: The Impact of Nitrogen-Hydrogen Annealing Treatments.
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| Title: | Low Resistivity and High Carrier Concentration in SnO |
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| Authors: | Chen QZ; Xiamen Key Laboratory of Development and Application for Advanced Semiconductor Coating Technology, The School of Opto-Electronic and Communication Engineering, Xiamen University of Technology, Xiamen 361024, China., Zhang ZX; Institute of Optoelectronic Display, National & Local United Engineering Lab of Flat Panel Display Technology, Fuzhou University, Fuzhou 350002, China.; School of Advanced Manufacturing, Fuzhou University, Quanzhou 362200, China., Fu WQ; Xiamen Key Laboratory of Development and Application for Advanced Semiconductor Coating Technology, The School of Opto-Electronic and Communication Engineering, Xiamen University of Technology, Xiamen 361024, China., Duan JR; Xiamen Key Laboratory of Development and Application for Advanced Semiconductor Coating Technology, The School of Opto-Electronic and Communication Engineering, Xiamen University of Technology, Xiamen 361024, China., Yang YX; Xiamen Key Laboratory of Development and Application for Advanced Semiconductor Coating Technology, The School of Opto-Electronic and Communication Engineering, Xiamen University of Technology, Xiamen 361024, China., Chen CN; Department of Computer Science and Information Engineering, Asia University, Taichung 413, Taiwan., Lien SY; Xiamen Key Laboratory of Development and Application for Advanced Semiconductor Coating Technology, The School of Opto-Electronic and Communication Engineering, Xiamen University of Technology, Xiamen 361024, China.; Department of Computer Science and Information Engineering, Asia University, Taichung 413, Taiwan. |
| Source: | Nanomaterials (Basel, Switzerland) [Nanomaterials (Basel)] 2025 Jun 25; Vol. 15 (13). Date of Electronic Publication: 2025 Jun 25. |
| Publication Type: | Journal Article |
| Journal Info: | Publisher: MDPI AG Country of Publication: Switzerland NLM ID: 101610216 Publication Model: Electronic Cited Medium: Print ISSN: 2079-4991 (Print) Linking ISSN: 20794991 NLM ISO Abbreviation: Nanomaterials (Basel) Subsets: PubMed not MEDLINE |
| Database: | MEDLINE Ultimate |
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| ISSN: | 2079-4991 |
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| DOI: | 10.3390/nano15130986 |
