APA (7th ed.) Citation

QZ, C., ZX, Z., WQ, F., JR, D., YX, Y., CN, C., & SY, L. (2025). Low Resistivity and High Carrier Concentration in SnO2 Thin Films: The Impact of Nitrogen-Hydrogen Annealing Treatments. Nanomaterials (Basel, Switzerland), 15(13), . https://doi.org/10.3390/nano15130986

Chicago Style (17th ed.) Citation

QZ, Chen, Zhang ZX, Fu WQ, Duan JR, Yang YX, Chen CN, and Lien SY. "Low Resistivity and High Carrier Concentration in SnO2 Thin Films: The Impact of Nitrogen-Hydrogen Annealing Treatments." Nanomaterials (Basel, Switzerland) 15, no. 13 (2025). https://doi.org/10.3390/nano15130986.

MLA (9th ed.) Citation

QZ, Chen, et al. "Low Resistivity and High Carrier Concentration in SnO2 Thin Films: The Impact of Nitrogen-Hydrogen Annealing Treatments." Nanomaterials (Basel, Switzerland), vol. 15, no. 13, 2025, https://doi.org/10.3390/nano15130986.