Reactive sputtering of SnS thin films using sulfur plasma and a metallic Tin target: achieving stoichiometry and large grains.
Saved in:
| Title: | Reactive sputtering of SnS thin films using sulfur plasma and a metallic Tin target: achieving stoichiometry and large grains. |
|---|---|
| Authors: | Motai D; Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, Sendai, 980-8577, Japan., Suzuki I; Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, Sendai, 980-8577, Japan. issei.suzuki@tohoku.ac.jp., Nogami T; Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, Sendai, 980-8577, Japan., Omata T; Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, Sendai, 980-8577, Japan. |
| Source: | Scientific reports [Sci Rep] 2025 Aug 07; Vol. 15 (1), pp. 28917. Date of Electronic Publication: 2025 Aug 07. |
| Publication Type: | Journal Article |
| Journal Info: | Publisher: Nature Publishing Group Country of Publication: England NLM ID: 101563288 Publication Model: Electronic Cited Medium: Internet ISSN: 2045-2322 (Electronic) Linking ISSN: 20452322 NLM ISO Abbreviation: Sci Rep Subsets: MEDLINE; PubMed not MEDLINE |
| Database: | MEDLINE Ultimate |
|
Full text is not displayed to guests.
Login for full access.
|
|
| ISSN: | 2045-2322 |
|---|---|
| DOI: | 10.1038/s41598-025-14093-x |
