Reactive sputtering of SnS thin films using sulfur plasma and a metallic Tin target: achieving stoichiometry and large grains.

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Title: Reactive sputtering of SnS thin films using sulfur plasma and a metallic Tin target: achieving stoichiometry and large grains.
Authors: Motai D; Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, Sendai, 980-8577, Japan., Suzuki I; Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, Sendai, 980-8577, Japan. issei.suzuki@tohoku.ac.jp., Nogami T; Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, Sendai, 980-8577, Japan., Omata T; Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, Sendai, 980-8577, Japan.
Source: Scientific reports [Sci Rep] 2025 Aug 07; Vol. 15 (1), pp. 28917. Date of Electronic Publication: 2025 Aug 07.
Publication Type: Journal Article
Journal Info: Publisher: Nature Publishing Group Country of Publication: England NLM ID: 101563288 Publication Model: Electronic Cited Medium: Internet ISSN: 2045-2322 (Electronic) Linking ISSN: 20452322 NLM ISO Abbreviation: Sci Rep Subsets: MEDLINE; PubMed not MEDLINE
Database: MEDLINE Ultimate
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  Data: Reactive sputtering of SnS thin films using sulfur plasma and a metallic Tin target: achieving stoichiometry and large grains.
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  Data: <searchLink fieldCode="AU" term="%22Motai+D%22">Motai D</searchLink>; Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, Sendai, 980-8577, Japan.<br /><searchLink fieldCode="AU" term="%22Suzuki+I%22">Suzuki I</searchLink>; Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, Sendai, 980-8577, Japan. issei.suzuki@tohoku.ac.jp.<br /><searchLink fieldCode="AU" term="%22Nogami+T%22">Nogami T</searchLink>; Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, Sendai, 980-8577, Japan.<br /><searchLink fieldCode="AU" term="%22Omata+T%22">Omata T</searchLink>; Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, Sendai, 980-8577, Japan.
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  Data: <searchLink fieldCode="JN" term="%22101563288%22">Scientific reports</searchLink> [Sci Rep] 2025 Aug 07; Vol. 15 (1), pp. 28917. <i>Date of Electronic Publication: </i>2025 Aug 07.
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  Data: <i>Publisher: </i><searchLink fieldCode="PB" term="%22Nature+Publishing+Group%22">Nature Publishing Group </searchLink><i>Country of Publication: </i>England <i>NLM ID: </i>101563288 <i>Publication Model: </i>Electronic <i>Cited Medium: </i>Internet <i>ISSN: </i>2045-2322 (Electronic) <i>Linking ISSN: </i><searchLink fieldCode="IS" term="%2220452322%22">20452322 </searchLink><i>NLM ISO Abbreviation: </i>Sci Rep <i>Subsets: </i>MEDLINE; PubMed not MEDLINE
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        Value: 10.1038/s41598-025-14093-x
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        Text: English
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      – TitleFull: Reactive sputtering of SnS thin films using sulfur plasma and a metallic Tin target: achieving stoichiometry and large grains.
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              Text: 2025 Aug 07
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