A stable monoclinic variant and resultant robust ferroelectricity in single-crystalline hafnia-based films.

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Title: A stable monoclinic variant and resultant robust ferroelectricity in single-crystalline hafnia-based films.
Authors: Geng WR; Bay Area Center for Electron Microscopy, Songshan Lake Materials Laboratory, Dongguan, China., Wang YJ; Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Shenyang, China., Zhu YL; Bay Area Center for Electron Microscopy, Songshan Lake Materials Laboratory, Dongguan, China.; School of Materials Science and Engineering, Hunan University of Science and Technology, Xiangtan, China., Zhang S; School of Advanced Materials and Nanotechnology, Xidian University, Xi'an, China., Ma H; Zhejiang Laboratory, Hangzhou, China., Tang YL; Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Shenyang, China., Tuo S; Zhejiang Laboratory, Hangzhou, China., Ma XL; Bay Area Center for Electron Microscopy, Songshan Lake Materials Laboratory, Dongguan, China. xlma@iphy.ac.cn.; Institute of Physics, Chinese Academy of Sciences, Beijing, China. xlma@iphy.ac.cn.; Quantum Science Center of Guangdong-HongKong-Macau Greater Bay Area (Guangdong), Shenzhen, China. xlma@iphy.ac.cn.
Source: Nature communications [Nat Commun] 2025 Oct 03; Vol. 16 (1), pp. 8842. Date of Electronic Publication: 2025 Oct 03.
Publication Type: Journal Article
Journal Info: Publisher: Nature Pub. Group Country of Publication: England NLM ID: 101528555 Publication Model: Electronic Cited Medium: Internet ISSN: 2041-1723 (Electronic) Linking ISSN: 20411723 NLM ISO Abbreviation: Nat Commun Subsets: MEDLINE; PubMed not MEDLINE
Database: MEDLINE Ultimate
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ISSN:2041-1723
DOI:10.1038/s41467-025-63907-z