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A stable monoclinic variant and resultant robust ferroelectricity in single-crystalline hafnia-based films.

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Title: A stable monoclinic variant and resultant robust ferroelectricity in single-crystalline hafnia-based films.
Authors: Geng WR; Bay Area Center for Electron Microscopy, Songshan Lake Materials Laboratory, Dongguan, China., Wang YJ; Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Shenyang, China., Zhu YL; Bay Area Center for Electron Microscopy, Songshan Lake Materials Laboratory, Dongguan, China.; School of Materials Science and Engineering, Hunan University of Science and Technology, Xiangtan, China., Zhang S; School of Advanced Materials and Nanotechnology, Xidian University, Xi'an, China., Ma H; Zhejiang Laboratory, Hangzhou, China., Tang YL; Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Shenyang, China., Tuo S; Zhejiang Laboratory, Hangzhou, China., Ma XL; Bay Area Center for Electron Microscopy, Songshan Lake Materials Laboratory, Dongguan, China. xlma@iphy.ac.cn.; Institute of Physics, Chinese Academy of Sciences, Beijing, China. xlma@iphy.ac.cn.; Quantum Science Center of Guangdong-HongKong-Macau Greater Bay Area (Guangdong), Shenzhen, China. xlma@iphy.ac.cn.
Source: Nature communications [Nat Commun] 2025 Oct 03; Vol. 16 (1), pp. 8842. Date of Electronic Publication: 2025 Oct 03.
Publication Type: Journal Article
Journal Info: Publisher: Nature Pub. Group Country of Publication: England NLM ID: 101528555 Publication Model: Electronic Cited Medium: Internet ISSN: 2041-1723 (Electronic) Linking ISSN: 20411723 NLM ISO Abbreviation: Nat Commun Subsets: MEDLINE; PubMed not MEDLINE
Database: MEDLINE Ultimate
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  Data: A stable monoclinic variant and resultant robust ferroelectricity in single-crystalline hafnia-based films.
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  Data: <searchLink fieldCode="AU" term="%22Geng+WR%22">Geng WR</searchLink>; Bay Area Center for Electron Microscopy, Songshan Lake Materials Laboratory, Dongguan, China.<br /><searchLink fieldCode="AU" term="%22Wang+YJ%22">Wang YJ</searchLink>; Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Shenyang, China.<br /><searchLink fieldCode="AU" term="%22Zhu+YL%22">Zhu YL</searchLink>; Bay Area Center for Electron Microscopy, Songshan Lake Materials Laboratory, Dongguan, China.; School of Materials Science and Engineering, Hunan University of Science and Technology, Xiangtan, China.<br /><searchLink fieldCode="AU" term="%22Zhang+S%22">Zhang S</searchLink>; School of Advanced Materials and Nanotechnology, Xidian University, Xi'an, China.<br /><searchLink fieldCode="AU" term="%22Ma+H%22">Ma H</searchLink>; Zhejiang Laboratory, Hangzhou, China.<br /><searchLink fieldCode="AU" term="%22Tang+YL%22">Tang YL</searchLink>; Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Shenyang, China.<br /><searchLink fieldCode="AU" term="%22Tuo+S%22">Tuo S</searchLink>; Zhejiang Laboratory, Hangzhou, China.<br /><searchLink fieldCode="AU" term="%22Ma+XL%22">Ma XL</searchLink>; Bay Area Center for Electron Microscopy, Songshan Lake Materials Laboratory, Dongguan, China. xlma@iphy.ac.cn.; Institute of Physics, Chinese Academy of Sciences, Beijing, China. xlma@iphy.ac.cn.; Quantum Science Center of Guangdong-HongKong-Macau Greater Bay Area (Guangdong), Shenzhen, China. xlma@iphy.ac.cn.
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  Data: <searchLink fieldCode="JN" term="%22101528555%22">Nature communications</searchLink> [Nat Commun] 2025 Oct 03; Vol. 16 (1), pp. 8842. <i>Date of Electronic Publication: </i>2025 Oct 03.
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              Text: 2025 Oct 03
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