Utilizing Venturi effect for automated high-throughput droplet-MS from well plates.

Saved in:
Bibliographic Details
Title: Utilizing Venturi effect for automated high-throughput droplet-MS from well plates.
Authors: Murray BE; Department of Chemistry, University of Michigan, Ann Arbor, MI 48109, USA. rtkenn@umich.edu., Diehl RC; Life Sciences Institute, University of Michigan, Ann Arbor, MI 48109, USA., Pott M; BASF SE, 67056 Ludwigshafen am Rhein, Germany., Holland-Moritz DA; Process Research and Development, Merck & Co., Inc., Rahway, New Jersey 07065, USA., Narayan ARH; Department of Chemistry, University of Michigan, Ann Arbor, MI 48109, USA. rtkenn@umich.edu.; Life Sciences Institute, University of Michigan, Ann Arbor, MI 48109, USA., Kennedy RT; Department of Chemistry, University of Michigan, Ann Arbor, MI 48109, USA. rtkenn@umich.edu.; Department of Pharmacology, University of Michigan, Ann Arbor, MI 48109, USA.
Source: The Analyst [Analyst] 2026 May 05; Vol. 151 (9), pp. 2533-2543. Date of Electronic Publication: 2026 May 05.
Publication Type: Journal Article
Journal Info: Publisher: Royal Society of Chemistry Country of Publication: England NLM ID: 0372652 Publication Model: Electronic Cited Medium: Internet ISSN: 1364-5528 (Electronic) Linking ISSN: 00032654 NLM ISO Abbreviation: Analyst Subsets: MEDLINE; PubMed not MEDLINE
Database: MEDLINE Ultimate
Description
ISSN:1364-5528
DOI:10.1039/d6an00065g