Reversible Thickness Engineering in Amorphous In2O3 Transistors.

Saved in:
Bibliographic Details
Title: Reversible Thickness Engineering in Amorphous In2O3 Transistors.
Authors: Pan YY; Institute of Electronics, National Yang Ming Chiao Tung University, Hsinchu 300093, Taiwan., Hsu CH; Institute of Pioneer Semiconductor Innovation, National Yang Ming Chiao Tung University, Hsinchu 300093, Taiwan., Tseng R; Institute of Electronics, National Yang Ming Chiao Tung University, Hsinchu 300093, Taiwan., Wang ST; Institute of Pioneer Semiconductor Innovation, National Yang Ming Chiao Tung University, Hsinchu 300093, Taiwan., Chang YC; Institute of Electronics, National Yang Ming Chiao Tung University, Hsinchu 300093, Taiwan., Chen SC; Institute of Pioneer Semiconductor Innovation, National Yang Ming Chiao Tung University, Hsinchu 300093, Taiwan., Kimura T; Department of Physics, Kyushu University, 744 Motooka, Fukuoka 819-0395, Japan., Lan YW; Department of Physics, National Taiwan Normal University, Taipei 116077, Taiwan., Lien DH; Institute of Electronics, National Yang Ming Chiao Tung University, Hsinchu 300093, Taiwan.
Source: Nano letters [Nano Lett] 2026 May 20; Vol. 26 (19), pp. 6270-6277. Date of Electronic Publication: 2026 Apr 13.
Publication Type: Journal Article
Journal Info: Publisher: American Chemical Society Country of Publication: United States NLM ID: 101088070 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1530-6992 (Electronic) Linking ISSN: 15306984 NLM ISO Abbreviation: Nano Lett Subsets: MEDLINE; PubMed not MEDLINE
Database: MEDLINE Ultimate
FullText Text:
  Availability: 0
Header DbId: mdl
DbLabel: MEDLINE Ultimate
An: 41972489
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
IllustrationInfo
Items – Name: Title
  Label: Title
  Group: Ti
  Data: Reversible Thickness Engineering in Amorphous In<subscript>2</subscript>O<subscript>3</subscript> Transistors.
– Name: Author
  Label: Authors
  Group: Au
  Data: <searchLink fieldCode="AU" term="%22Pan+YY%22">Pan YY</searchLink>; Institute of Electronics, National Yang Ming Chiao Tung University, Hsinchu 300093, Taiwan.<br /><searchLink fieldCode="AU" term="%22Hsu+CH%22">Hsu CH</searchLink>; Institute of Pioneer Semiconductor Innovation, National Yang Ming Chiao Tung University, Hsinchu 300093, Taiwan.<br /><searchLink fieldCode="AU" term="%22Tseng+R%22">Tseng R</searchLink>; Institute of Electronics, National Yang Ming Chiao Tung University, Hsinchu 300093, Taiwan.<br /><searchLink fieldCode="AU" term="%22Wang+ST%22">Wang ST</searchLink>; Institute of Pioneer Semiconductor Innovation, National Yang Ming Chiao Tung University, Hsinchu 300093, Taiwan.<br /><searchLink fieldCode="AU" term="%22Chang+YC%22">Chang YC</searchLink>; Institute of Electronics, National Yang Ming Chiao Tung University, Hsinchu 300093, Taiwan.<br /><searchLink fieldCode="AU" term="%22Chen+SC%22">Chen SC</searchLink>; Institute of Pioneer Semiconductor Innovation, National Yang Ming Chiao Tung University, Hsinchu 300093, Taiwan.<br /><searchLink fieldCode="AU" term="%22Kimura+T%22">Kimura T</searchLink>; Department of Physics, Kyushu University, 744 Motooka, Fukuoka 819-0395, Japan.<br /><searchLink fieldCode="AU" term="%22Lan+YW%22">Lan YW</searchLink>; Department of Physics, National Taiwan Normal University, Taipei 116077, Taiwan.<br /><searchLink fieldCode="AU" term="%22Lien+DH%22">Lien DH</searchLink>; Institute of Electronics, National Yang Ming Chiao Tung University, Hsinchu 300093, Taiwan.
– Name: TitleSource
  Label: Source
  Group: Src
  Data: <searchLink fieldCode="JN" term="%22101088070%22">Nano letters</searchLink> [Nano Lett] 2026 May 20; Vol. 26 (19), pp. 6270-6277. <i>Date of Electronic Publication: </i>2026 Apr 13.
– Name: TypePub
  Label: Publication Type
  Group: TypPub
  Data: Journal Article
– Name: TitleSource
  Label: Journal Info
  Group: Src
  Data: <i>Publisher: </i><searchLink fieldCode="PB" term="%22American+Chemical+Society%22">American Chemical Society </searchLink><i>Country of Publication: </i>United States <i>NLM ID: </i>101088070 <i>Publication Model: </i>Print-Electronic <i>Cited Medium: </i>Internet <i>ISSN: </i>1530-6992 (Electronic) <i>Linking ISSN: </i><searchLink fieldCode="IS" term="%2215306984%22">15306984 </searchLink><i>NLM ISO Abbreviation: </i>Nano Lett <i>Subsets: </i>MEDLINE; PubMed not MEDLINE
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=mdl&AN=41972489
RecordInfo BibRecord:
  BibEntity:
    Identifiers:
      – Type: doi
        Value: 10.1021/acs.nanolett.5c06228
    Languages:
      – Code: eng
        Text: English
    PhysicalDescription:
      Pagination:
        StartPage: 6270
    Titles:
      – TitleFull: Reversible Thickness Engineering in Amorphous In2O3 Transistors.
        Type: main
  BibRelationships:
    HasContributorRelationships:
      – PersonEntity:
          Name:
            NameFull: Pan YY
      – PersonEntity:
          Name:
            NameFull: Hsu CH
      – PersonEntity:
          Name:
            NameFull: Tseng R
      – PersonEntity:
          Name:
            NameFull: Wang ST
      – PersonEntity:
          Name:
            NameFull: Chang YC
      – PersonEntity:
          Name:
            NameFull: Chen SC
      – PersonEntity:
          Name:
            NameFull: Kimura T
      – PersonEntity:
          Name:
            NameFull: Lan YW
      – PersonEntity:
          Name:
            NameFull: Lien DH
    IsPartOfRelationships:
      – BibEntity:
          Dates:
            – D: 20
              M: 05
              Text: 2026 May 20
              Type: published
              Y: 2026
          Identifiers:
            – Type: issn-electronic
              Value: 1530-6992
          Numbering:
            – Type: volume
              Value: 26
            – Type: issue
              Value: 19
          Titles:
            – TitleFull: Nano letters
              Type: main
ResultId 1