| Authors: |
Hollenbach JD; Johns Hopkins University, Department of Materials Science and Engineering, Baltimore, 21218, MD, USA., Koppell SA; Johns Hopkins University, Department of Materials Science and Engineering, Baltimore, 21218, MD, USA., Smalley D; Johns Hopkins University, Department of Materials Science and Engineering, Baltimore, 21218, MD, USA., Francis C; Direct Electron, LP., San Diego, 92128, CA, USA., Levin BDA; Direct Electron, LP., San Diego, 92128, CA, USA., Macy J; Pacific Northwest National Laboratory, Physical Sciences Division, Richland, 99354, WA, USA., Wang CF; Pacific Northwest National Laboratory, Physical Sciences Division, Richland, 99354, WA, USA., Reed BW; Integrated Dynamic Electron Solutions, Inc., Pleasanton, 94588, CA, USA., Taheri ML; Johns Hopkins University, Department of Materials Science and Engineering, Baltimore, 21218, MD, USA; Pacific Northwest National Laboratory, Physical Sciences Division, Richland, 99354, WA, USA. Electronic address: mtaheri4@jhu.edu. |